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A guide to the applications of ICP-MS in the semiconductor industry, including the control of metal contaminants.
| Chinese (Simplified) (China) | Complete (PDF) |
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Determination of 25 and 30 nm Fe3O4 NPs in low-particle concentration solutions
Characterization of Ag, Fe3O4, Al2O3, Au, and SiO2 NPs in TMAH in a single analytical run
| Japanese (Japan) | Complete (PDF) |
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| Chinese (Simplified) (China) | Complete (PDF) |
Low-ppt determination of alkali metals in high matrix samples using the optional "m-lens"
| Chinese (Simplified) (China) | Complete (PDF) |
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必威体育登录手机Online MSA calibration using prepFAST S automated sample introduction and Agilent 8900 ICP-QQQ
| Chinese (Simplified) (China) | Complete (PDF) |
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Direct analysis of sub-ppt to ppt levels of 49 elements in undiluted HNO3 by triple quadrupole ICP-MS (ICP-QQQ).
| Chinese (Simplified) (China) | Complete (PDF) |
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50 elements in HCl were analysed using MS/MS mode to resolve the polyatomic interferences.All analytes could be determined directly in the undiluted HCl with single digit ppt detection limits.
| Chinese (Simplified) (China) | Complete (PDF) |
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Detection limits in the single digit ppt or sub-ppt range were obtained for 48 elements, demonstrating the ability of the 7700s/7900 to routinely measure trace contaminants.
| Publication Part Number | 5990-7914EN | ||
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| Chinese (Simplified) (China) | Complete (PDF) |
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必威体育登录手机Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
| Publication Part Number | 5990-7354EN | ||
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| Chinese (Simplified) (China) | Complete (PDF) |
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Determination of ultra trace levels of elemental impurities in semiconductor grade H2O2.
| Chinese (Simplified) (China) | Complete (PDF) |
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Intuvo Method for Sulfur Compounds following ASTM Method D5623
Application note for Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
| Chinese (Simplified) (China) | Complete (PDF) |
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必威体育登录手机Application note for Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS
| Chinese (Simplified) (China) | Complete (PDF) |
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必威体育登录手机Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples
| Publication Part Number | 5990-6195EN | ||
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A simple method for analyzing photoresists using reaction cell ICP-MS is discussed.必威体育登录手机The Agilent 7500cs ICP-MS, which features a high sensitivity version...
| Chinese (Simplified) (China) | Complete (PDF) |
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| Publication Part Number | 5990-9961EN | |||||
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