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必威体育登录手机Agilent 8900 ICP-QQQ integrated with IAS Expert PS VPD provides the sensitivity and robustness required for 24/7 contamination control of wafers
- Publication Part Number: 5994-6135en
- Created: 12 July 2023
- 2 MB
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必威体育登录手机Application note for investigating the angular dependence of absolute specular reflection using the Agilent Cary 7000 UMS.
- Publication Part Number: 5991-2523EN
- Created: 29 Dec 2022
- 2 MB
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必威体育登录手机Application note for a faster, more accurate way of characterizing cube beamsplitters using the Agilent Cary 7000 Universal Measurement Spectrophotometer (UMS).
- Publication Part Number: 5991-2522EN
- Created: 07 Dec 2022
- 957 KB
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A guide to the applications of ICP-MS in the semiconductor industry, including the control of metal contaminants.
- Publication Part Number: 5991-9495EN
- Created: 01 June 2022
- 7 MB
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Metallic impurities in trichlorosilane (TCS), an intermediate product used in the production of photovoltaic (PV) silicon, must be strictly controlled in order to produce...
- Publication Part Number: 5990-8175EN
- Created: 20 Sep 2021
- 427 KB
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Chinese (Simplified) (China) | Complete (PDF) |
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必威体育登录手机Illustrates the advanced analytical performance and robustness of the Agilent 7700s/7900 ICP-MS for the direct determination of metallic impurities in high purity concentrated HCl.
- Publication Part Number: 5990-7354EN
- Created: 02 Oct 2017
- 447 KB
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Analyzing the purity of isopropyl via Microwave Plasma Atomic Emission Spectroscopy (MP-AES).
- Publication Part Number: 5991-6021EN
- Created: 17 July 2015
- 347 KB
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Application note for Determination of challenging elements in ultrapure semiconductor grade sulfuric acid by Triple Quadrupole ICP-MS
- Publication Part Number: 5991-2819EN
- Created: 18 Jan 2015
- 1 MB
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必威体育登录手机Application note for Improvement of ICP-MS detectability of phosphorus and titanium in high purity silicon samples using the Agilent 8800 Triple Quadrupole ICP-MS
- Publication Part Number: 5991-2466EN
- Created: 17 Feb 2014
- 938 KB
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必威体育登录手机Application note for Trace level analysis of sulfur, phosphorus, silicon and chlorine in NMP using the Agilent 8800 Triple Quadrupole ICP-MS
- Publication Part Number: 5991-2303EN
- Created: 19 Apr 2013
- 1 MB
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- Publication Part Number: 5990-9755EN
- Created: 24 Sep 2012
- 2 MB
必威体育登录手机Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples
- Publication Part Number: 5990-6195EN
- Created: 12 Aug 2010
- 774 KB
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必威体育登录手机A new quantitative method for the determination of ultratrace elemental impurities present in photovoltaic grade silicon is described using the Agilent 7500cs ICP-MS
- Publication Part Number: 5989-9859EN
- Created: 16 Oct 2008
- 76 KB
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