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A guide to the applications of ICP-MS in the semiconductor industry, including the control of metal contaminants.
- Publication Part Number: 5991-9495EN
- Created: 01 June 2022
- 7 MB
Chinese (Simplified) (China) | Complete (PDF) |
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The performance of the 8900 ICP-QQQ for the analysis of some of the most challenging elements for ICP-MS: phosphorus, sulfur, silicon, and chlorine
- Publication Part Number: 5991-6852EN
- Created: 01 June 2016
- 505 KB
Chinese (Simplified) (China) | Complete (PDF) |
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The 8800 ICP-QQQ provides improved cool plasma performance combined with unique MS/MS mode reaction cell methodology to achieve a BEC of 30 ppq for K in ultrapure water...
- Publication Part Number: 5991-5372EN
- Created: 02 Dec 2014
- 155 KB
Chinese (Simplified) (China) | Complete (PDF) |
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必威体育登录手机Application note for Ultratrace measurement of calcium in ultrapure water using the Agilent 8800 Triple Quadrupole ICP-MS
- Publication Part Number: 5991-1693EN
- Created: 17 Feb 2014
- 1 MB
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Chinese (Simplified) (China) | Complete (PDF) |
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必威体育登录手机Basic Performance of the Agilent 7700s ICP-MS for the Analysis of Semiconductor Samples
- Publication Part Number: 5990-6195EN
- Created: 12 Aug 2010
- 774 KB
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本研究的目的是找到一種經濟有效的超純水 (UPW) 儲存方法。目標是找到一種低成本材料,該材料不含汙染金屬。
- Publication Part Number: 5989-5782ZHCN
- Created: 15 Apr 2019
- 159 KB
解決氣相柱QC 測試中所關注的問題
- Publication Part Number: 5990-9961CHCN
- Created: 05 Mar 2012
- 647 KB
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